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Reading and Writing at the Atomic Scale

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The pulsed plasmas used for EUV light generation for lithography applications has the side effect of coating the lenses used to focus it. Understanding this plasma is critical to understanding how to improve performance.
Electron beams are used for various imaging applications, the energy and divergence of these beams play a major role in performance and needs to be measured and understood.

Impedans offer a range of products suitable for EUV and other imaging applications. We have products suited for research and development and/or new equipment design.

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